High-k and ALD/CVD Metal Precursors

Global Market Trajectory & Analytics

MCP21969

EXECUTIVE ENGAGEMENTS

POOL

747
Number of executives repeatedly engaged by snail & email outreach

INTERACTIONS

149
Interactions with Platform & by Email

PARTICIPANTS

32
Unique # Participated

VALIDATIONS

12
Responses Validated*

COMPANIES

36
Responses Validated*
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DATE

JUN 2021

TABLES

60

PAGES

212

EDITION

8

PRICE

USD 5600

CODE

MCP21969


COMPETITIVE METRICS

COMPANY

D S N T

% *

Adeka Corporation

Air Liquide SA

Applied Materials, Inc.

ASM International NV

Azelis

BASF SE

City Chemical LLC

Colnatec LLC

DNF Co., Ltd.

Dockweiler Chemicals GmbH

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HIGHLIGHTS & REPORT INDEX

Global High-k and ALD/CVD Metal Precursors Market to Reach $705.6 Million by 2026

A sub-set of CVD, Atomic layer deposition (AVD) is a process that enables atomic level control as well as deposition to be achieved. The ALD technique involves feeding of different cursors alternatingly, into a reaction chamber, one after the other, where they undergo different self-limiting surface reactions. In each of those reaction cycles, same quantity of material is deposited which leads to alternating layers of those different materials. The layers are smooth, highly dense and have uniform thickness. ALD represents a method for depositing thin films of multi-components, by way of co-injecting precursors like Si and Hf, so that a single, homogenous layered film is formed. This is used in many applications including 3D NAND, FinFET and self-aligned patterning among others. With ALD, it is possible to create dielectric and metal films as per the requirements of precursor. It is a technique of thin-film deposition based on sequential application of CVD process with two chemicals. These chemicals are called reactants or precursors. They react with material surface in a self-limiting, sequential manner, one after the other. ALD is considered an important process for fabrication of semiconductor devices for nanomaterials synthesis. The materials possess very high dielectric values capable of rapidly storing and accessing data. Another important benefit with the technique is that it offers exceptional deposition conformality, in high aspect ratio structures. Thickness control offered by the method is at Angstrom level. Thin films using high-? dielectric materials like ZrO2, HfO2, Ta2O5 and Al2O3 can be produced using the technique for high-? gate oxides, DRAM as well as nitrides for interconnects and electrodes. ALD/CVD processes are attractive mainly because they make possible growing of thin films which can be highly uniform and which conform to the given specifications.

Global High-k and ALD/CVD Metal Precursors market is projected to register healthy growth over the near-to-long term. The market, estimated at US$472.8 Million in 2020 is projected to reach US$705.6 Million by 2026, registering a compounded annual growth rate (CAGR) of 7.0% over the analysis period. Asia-Pacific represents the largest regional market for High-k and ALD/CVD Metal Precursors, accounting for an estimated 48.9% share of the global total in 2020. The market, estimated at US$231.3 Million in 2020 is projected to reach US$376.8 Million by the end of the analysis period. China is expected to spearhead growth and emerge as the fastest growing regional market with a CAGR of 8.7% over the analysis period. The market is expected to progress steadily to evolve as a major regional market for High-k and ALD/CVD Metal Precursors, supported by various factors conducive to healthy growth.

By Technology, Interconnect Segment to Reach $360.1 Million by 2026

Global market for Interconnect (Technology) segment is estimated at US$248.3 Million in 2020, and is projected to reach US$360.1 Million by 2026 reflecting a compounded annual growth rate of 6.5% over the analysis period. Asia-Pacific constitutes the largest regional market for Interconnect segment, accounting for 45.7% of the global sales in 2020. China is poised to register the fastest compounded annual growth rate of 8.1% over the analysis period, to reach US$67 Million by the end of the analysis period.

SELECT PLAYERS

ADEKA Corporation; Air Liquide S.A.; Colnatec LLC; DuPont de Nemours, Inc.; Entegris, Inc.; Linde plc; Merck KGaA; Nanmat Technology Co., Ltd.; Strem Chemicals, Inc.; Tri Chemical Laboratories Inc.; UP Chemical Co., Ltd

SEGMENTS

» Technology (Interconnect, Capacitor, Gates)

GEOGRAPHIES

» World » USA » Japan » China » Europe » France » Germany » Italy » UK » Rest of Europe » Asia-Pacific » South Korea » Taiwan » Rest of Asia-Pacific » Rest of World

TABLE OF CONTENTS

1. MARKET OVERVIEW
Impact of COVID-19 Pandemic and Looming Global Recession
2020 Marked as a Year of Disruption & Transformation
EXHIBIT: World Economic Growth Projections (Real GDP, Annual % Change) for 2020 through 2022
A Retrospective Review of Year 2020 that Left the World in Shambles & Industries and Markets Upended
EXHIBIT: Supply Chain Disruptions Impact Large Number of Electronic Manufacturers: % of Companies Impacted by Supply Chain Delays Due to COVID-19 Worldwide as of May 2020
Semiconductor Trends for Specific End-Use Categories
COVID-19 Pandemic Storm Warrants New Strategies to Help Semiconductor Leaders Secure New Lease of Life
Pandemic Disrupts High-κ and ALD CVD Metal Precursors Supply Chain
An Introduction to High-κ and ALD/CVD Metal Precursors
Types of ALD Precursors
Global Market Prospects & Outlook
Interconnects Segment Leads the Global Market
Asia-Pacific Continues to Spearhead Market Growth
Competition
Recent Market Activity
2. FOCUS ON SELECT PLAYERS
3. MARKET TRENDS & DRIVERS
Atomic Layer Deposition: Adding New Dimensions to Advanced Chip Designs
Advantages & Disadvantages of ALD
ALD for High-κ Layers to Improve Semiconductor Technologies
Microelectronics: Among the Leading Adopters of High-κ and ALD Metal Precursors
ALD Emerges as a Vital Process for Fabricating Microelectronics
Miniaturization of Electronic Devices Spells Opportunities
Focus on Harnessing Digital Transformation Bodes Well for Semiconductors, Presenting Opportunities for the Market
EXHIBIT: COVID-19 Has Created an Environment Where Digital Transformation Equals Survival: Global Digital Transformation Spending (In US$ Billion) for Years 2017 Through 2023
Growing Importance of High-κ Precursors in Modern Semiconductor Devices to Fuel Market Prospects
EXHIBIT: High-κ Dielectric Candidates and Relevant Properties
High-κ Precursors in Next-Generation Memory & Semiconductor Devices
Need for Faster Access and Storage of Data Drives Demand for High-κ Value Materials
High-κ Materials for Next Generation of DRAM Capacitors
Advancing ALD Technology Drives Demand for Thin-Film Materials in New Industrial Applications, Presenting Market Opportunities
EXHIBIT: Global Market for Industrial Semiconductors (In US$ Billion) for Years 2020, 2022 & 2024
Rising Demand for More Sophisticated Industrial PCs Widen the Prospects
Industry 4.0 & Smart Factory to Steer Future Expansion
EXHIBIT: Major Industry 4.0 Technologies: Global Market Size (US$ Billion) for Internet of Things (IoT), Big Data, Smart factory, Advanced Analytics, Service Robotics, and Smart Machines for 2020
Consumer Electronics: A Major End-Use Market for Semiconductor Devices Lends Traction to Market Growth
EXHIBIT: Smartphone Penetration Rate as Share of Total Population: 2016-2021
EXHIBIT: World Tablet PCs Market: Breakdown of Annual Volume Sales (in Million Units) for the Years 2013, 2018 & 2019
Thin Metallic Films Manufacturing: A Promising Area of Growth
Growing Role of ALD in Photovoltaic Devices to Boost Market Prospects
COVID-19 Outbreak Affects Solar PV Industry Operations
EXHIBIT: COVID-19 Impact on Solar Industry: Solar PV Capacity Additions (in GW) by Sector for 2019 and 2020
EXHIBIT: Solar PV Capacity Additions (in GW) by Sector for China, Europe, USA and India: 2019
Rising Importance of ALD in Energy Storage Applications to Spur Demand for Metal Precursors
Market Benefits from the Growing Use of Nanotechnologies in Semiconductors Industry
Role of High-κ and ALD/CVD Metal Precursors in VLSI Technology to Maintain Capacitor of Semiconductor Devices
Selection of Precursor in ALD/CVD: A Key Factor
Limitations of TiCl4 Precursors Drive Shift towards Metal-Organic Options for Thin-Film Deposition in Semiconductor & Non-Semiconductor Applications
Atomic Layer Deposition to Facilitate Metal Gate Stacking for CMOS
High-κ Dielectrics Display Variations in Leakage with Aspect Ratio
Non-Ideal ALD Processes: Primary Challenges & Mitigation Efforts
4. GLOBAL MARKET PERSPECTIVE
World Current & Future Analysis for High-k and ALD/CVD Metal Precursors by Geographic Region - USA, Japan, China, Europe, Asia-Pacific and Rest of World Markets - Independent Analysis of Annual Revenues in US$ Thousand for Years 2020 through 2027 and % CAGR
World Historic Review for High-k and ALD/CVD Metal Precursors by Geographic Region - USA, Japan, China, Europe, Asia-Pacific and Rest of World Markets - Independent Analysis of Annual Revenues in US$ Thousand for Years 2015 through 2019 and % CAGR
World 12-Year Perspective for High-k and ALD/CVD Metal Precursors by Geographic Region - Percentage Breakdown of Value Revenues for USA, Japan, China, Europe, Asia-Pacific and Rest of World Markets for Years 2015, 2020 & 2027
World Current & Future Analysis for Interconnect by Geographic Region - USA, Japan, China, Europe, Asia-Pacific and Rest of World Markets - Independent Analysis of Annual Revenues in US$ Thousand for Years 2020 through 2027 and % CAGR
World Historic Review for Interconnect by Geographic Region - USA, Japan, China, Europe, Asia-Pacific and Rest of World Markets - Independent Analysis of Annual Revenues in US$ Thousand for Years 2015 through 2019 and % CAGR
World 12-Year Perspective for Interconnect by Geographic Region - Percentage Breakdown of Value Revenues for USA, Japan, China, Europe, Asia-Pacific and Rest of World for Years 2015, 2020 & 2027
World Current & Future Analysis for Capacitor by Geographic Region - USA, Japan, China, Europe, Asia-Pacific and Rest of World Markets - Independent Analysis of Annual Revenues in US$ Thousand for Years 2020 through 2027 and % CAGR
World Historic Review for Capacitor by Geographic Region - USA, Japan, China, Europe, Asia-Pacific and Rest of World Markets - Independent Analysis of Annual Revenues in US$ Thousand for Years 2015 through 2019 and % CAGR
World 12-Year Perspective for Capacitor by Geographic Region - Percentage Breakdown of Value Revenues for USA, Japan, China, Europe, Asia-Pacific and Rest of World for Years 2015, 2020 & 2027
World Current & Future Analysis for Gates by Geographic Region - USA, Japan, China, Europe, Asia-Pacific and Rest of World Markets - Independent Analysis of Annual Revenues in US$ Thousand for Years 2020 through 2027 and % CAGR
World Historic Review for Gates by Geographic Region - USA, Japan, China, Europe, Asia-Pacific and Rest of World Markets - Independent Analysis of Annual Revenues in US$ Thousand for Years 2015 through 2019 and % CAGR
World 12-Year Perspective for Gates by Geographic Region - Percentage Breakdown of Value Revenues for USA, Japan, China, Europe, Asia-Pacific and Rest of World for Years 2015, 2020 & 2027
UNITED STATES
USA Current & Future Analysis for High-k and ALD/CVD Metal Precursors by Technology - Interconnect, Capacitor and Gates - Independent Analysis of Annual Revenues in US$ Thousand for the Years 2020 through 2027 and % CAGR
USA Historic Review for High-k and ALD/CVD Metal Precursors by Technology - Interconnect, Capacitor and Gates Markets - Independent Analysis of Annual Revenues in US$ Thousand for Years 2015 through 2019 and % CAGR
USA 12-Year Perspective for High-k and ALD/CVD Metal Precursors by Technology - Percentage Breakdown of Value Revenues for Interconnect, Capacitor and Gates for the Years 2015, 2020 & 2027
JAPAN
Japan Current & Future Analysis for High-k and ALD/CVD Metal Precursors by Technology - Interconnect, Capacitor and Gates - Independent Analysis of Annual Revenues in US$ Thousand for the Years 2020 through 2027 and % CAGR
Japan Historic Review for High-k and ALD/CVD Metal Precursors by Technology - Interconnect, Capacitor and Gates Markets - Independent Analysis of Annual Revenues in US$ Thousand for Years 2015 through 2019 and % CAGR
Japan 12-Year Perspective for High-k and ALD/CVD Metal Precursors by Technology - Percentage Breakdown of Value Revenues for Interconnect, Capacitor and Gates for the Years 2015, 2020 & 2027
CHINA
China Current & Future Analysis for High-k and ALD/CVD Metal Precursors by Technology - Interconnect, Capacitor and Gates - Independent Analysis of Annual Revenues in US$ Thousand for the Years 2020 through 2027 and % CAGR
China Historic Review for High-k and ALD/CVD Metal Precursors by Technology - Interconnect, Capacitor and Gates Markets - Independent Analysis of Annual Revenues in US$ Thousand for Years 2015 through 2019 and % CAGR
China 12-Year Perspective for High-k and ALD/CVD Metal Precursors by Technology - Percentage Breakdown of Value Revenues for Interconnect, Capacitor and Gates for the Years 2015, 2020 & 2027
EUROPE
Europe Current & Future Analysis for High-k and ALD/CVD Metal Precursors by Geographic Region - France, Germany, Italy, UK and Rest of Europe Markets - Independent Analysis of Annual Revenues in US$ Thousand for Years 2020 through 2027 and % CAGR
Europe Historic Review for High-k and ALD/CVD Metal Precursors by Geographic Region - France, Germany, Italy, UK and Rest of Europe Markets - Independent Analysis of Annual Revenues in US$ Thousand for Years 2015 through 2019 and % CAGR
Europe 12-Year Perspective for High-k and ALD/CVD Metal Precursors by Geographic Region - Percentage Breakdown of Value Revenues for France, Germany, Italy, UK and Rest of Europe Markets for Years 2015, 2020 & 2027
Europe Current & Future Analysis for High-k and ALD/CVD Metal Precursors by Technology - Interconnect, Capacitor and Gates - Independent Analysis of Annual Revenues in US$ Thousand for the Years 2020 through 2027 and % CAGR
Europe Historic Review for High-k and ALD/CVD Metal Precursors by Technology - Interconnect, Capacitor and Gates Markets - Independent Analysis of Annual Revenues in US$ Thousand for Years 2015 through 2019 and % CAGR
Europe 12-Year Perspective for High-k and ALD/CVD Metal Precursors by Technology - Percentage Breakdown of Value Revenues for Interconnect, Capacitor and Gates for the Years 2015, 2020 & 2027
FRANCE
France Current & Future Analysis for High-k and ALD/CVD Metal Precursors by Technology - Interconnect, Capacitor and Gates - Independent Analysis of Annual Revenues in US$ Thousand for the Years 2020 through 2027 and % CAGR
France Historic Review for High-k and ALD/CVD Metal Precursors by Technology - Interconnect, Capacitor and Gates Markets - Independent Analysis of Annual Revenues in US$ Thousand for Years 2015 through 2019 and % CAGR
France 12-Year Perspective for High-k and ALD/CVD Metal Precursors by Technology - Percentage Breakdown of Value Revenues for Interconnect, Capacitor and Gates for the Years 2015, 2020 & 2027
GERMANY
Germany Current & Future Analysis for High-k and ALD/CVD Metal Precursors by Technology - Interconnect, Capacitor and Gates - Independent Analysis of Annual Revenues in US$ Thousand for the Years 2020 through 2027 and % CAGR
Germany Historic Review for High-k and ALD/CVD Metal Precursors by Technology - Interconnect, Capacitor and Gates Markets - Independent Analysis of Annual Revenues in US$ Thousand for Years 2015 through 2019 and % CAGR
Germany 12-Year Perspective for High-k and ALD/CVD Metal Precursors by Technology - Percentage Breakdown of Value Revenues for Interconnect, Capacitor and Gates for the Years 2015, 2020 & 2027
ITALY
Italy Current & Future Analysis for High-k and ALD/CVD Metal Precursors by Technology - Interconnect, Capacitor and Gates - Independent Analysis of Annual Revenues in US$ Thousand for the Years 2020 through 2027 and % CAGR
Italy Historic Review for High-k and ALD/CVD Metal Precursors by Technology - Interconnect, Capacitor and Gates Markets - Independent Analysis of Annual Revenues in US$ Thousand for Years 2015 through 2019 and % CAGR
Italy 12-Year Perspective for High-k and ALD/CVD Metal Precursors by Technology - Percentage Breakdown of Value Revenues for Interconnect, Capacitor and Gates for the Years 2015, 2020 & 2027
UNITED KINGDOM
UK Current & Future Analysis for High-k and ALD/CVD Metal Precursors by Technology - Interconnect, Capacitor and Gates - Independent Analysis of Annual Revenues in US$ Thousand for the Years 2020 through 2027 and % CAGR
UK Historic Review for High-k and ALD/CVD Metal Precursors by Technology - Interconnect, Capacitor and Gates Markets - Independent Analysis of Annual Revenues in US$ Thousand for Years 2015 through 2019 and % CAGR
UK 12-Year Perspective for High-k and ALD/CVD Metal Precursors by Technology - Percentage Breakdown of Value Revenues for Interconnect, Capacitor and Gates for the Years 2015, 2020 & 2027
REST OF EUROPE
Rest of Europe Current & Future Analysis for High-k and ALD/CVD Metal Precursors by Technology - Interconnect, Capacitor and Gates - Independent Analysis of Annual Revenues in US$ Thousand for the Years 2020 through 2027 and % CAGR
Rest of Europe Historic Review for High-k and ALD/CVD Metal Precursors by Technology - Interconnect, Capacitor and Gates Markets - Independent Analysis of Annual Revenues in US$ Thousand for Years 2015 through 2019 and % CAGR
Rest of Europe 12-Year Perspective for High-k and ALD/CVD Metal Precursors by Technology - Percentage Breakdown of Value Revenues for Interconnect, Capacitor and Gates for the Years 2015, 2020 & 2027
ASIA-PACIFIC
Asia-Pacific Current & Future Analysis for High-k and ALD/CVD Metal Precursors by Geographic Region - South Korea, Taiwan and Rest of Asia-Pacific Markets - Independent Analysis of Annual Revenues in US$ Thousand for Years 2020 through 2027 and % CAGR
Asia-Pacific Historic Review for High-k and ALD/CVD Metal Precursors by Geographic Region - South Korea, Taiwan and Rest of Asia-Pacific Markets - Independent Analysis of Annual Revenues in US$ Thousand for Years 2015 through 2019 and % CAGR
Asia-Pacific 12-Year Perspective for High-k and ALD/CVD Metal Precursors by Geographic Region - Percentage Breakdown of Value Revenues for South Korea, Taiwan and Rest of Asia-Pacific Markets for Years 2015, 2020 & 2027
Asia-Pacific Current & Future Analysis for High-k and ALD/CVD Metal Precursors by Technology - Interconnect, Capacitor and Gates - Independent Analysis of Annual Revenues in US$ Thousand for the Years 2020 through 2027 and % CAGR
Asia-Pacific Historic Review for High-k and ALD/CVD Metal Precursors by Technology - Interconnect, Capacitor and Gates Markets - Independent Analysis of Annual Revenues in US$ Thousand for Years 2015 through 2019 and % CAGR
Asia-Pacific 12-Year Perspective for High-k and ALD/CVD Metal Precursors by Technology - Percentage Breakdown of Value Revenues for Interconnect, Capacitor and Gates for the Years 2015, 2020 & 2027
SOUTH KOREA
South Korea Current & Future Analysis for High-k and ALD/CVD Metal Precursors by Technology - Interconnect, Capacitor and Gates - Independent Analysis of Annual Revenues in US$ Thousand for the Years 2020 through 2027 and % CAGR
South Korea Historic Review for High-k and ALD/CVD Metal Precursors by Technology - Interconnect, Capacitor and Gates Markets - Independent Analysis of Annual Revenues in US$ Thousand for Years 2015 through 2019 and % CAGR
South Korea 12-Year Perspective for High-k and ALD/CVD Metal Precursors by Technology - Percentage Breakdown of Value Revenues for Interconnect, Capacitor and Gates for the Years 2015, 2020 & 2027
TAIWAN
Taiwan Current & Future Analysis for High-k and ALD/CVD Metal Precursors by Technology - Interconnect, Capacitor and Gates - Independent Analysis of Annual Revenues in US$ Thousand for the Years 2020 through 2027 and % CAGR
Taiwan Historic Review for High-k and ALD/CVD Metal Precursors by Technology - Interconnect, Capacitor and Gates Markets - Independent Analysis of Annual Revenues in US$ Thousand for Years 2015 through 2019 and % CAGR
Taiwan 12-Year Perspective for High-k and ALD/CVD Metal Precursors by Technology - Percentage Breakdown of Value Revenues for Interconnect, Capacitor and Gates for the Years 2015, 2020 & 2027
REST OF ASIA-PACIFIC
Rest of Asia-Pacific Current & Future Analysis for High-k and ALD/CVD Metal Precursors by Technology - Interconnect, Capacitor and Gates - Independent Analysis of Annual Revenues in US$ Thousand for the Years 2020 through 2027 and % CAGR
Rest of Asia-Pacific Historic Review for High-k and ALD/CVD Metal Precursors by Technology - Interconnect, Capacitor and Gates Markets - Independent Analysis of Annual Revenues in US$ Thousand for Years 2015 through 2019 and % CAGR
Rest of Asia-Pacific 12-Year Perspective for High-k and ALD/CVD Metal Precursors by Technology - Percentage Breakdown of Value Revenues for Interconnect, Capacitor and Gates for the Years 2015, 2020 & 2027
REST OF WORLD
Rest of World Current & Future Analysis for High-k and ALD/CVD Metal Precursors by Technology - Interconnect, Capacitor and Gates - Independent Analysis of Annual Revenues in US$ Thousand for the Years 2020 through 2027 and % CAGR
Rest of World Historic Review for High-k and ALD/CVD Metal Precursors by Technology - Interconnect, Capacitor and Gates Markets - Independent Analysis of Annual Revenues in US$ Thousand for Years 2015 through 2019 and % CAGR
Rest of World 12-Year Perspective for High-k and ALD/CVD Metal Precursors by Technology - Percentage Breakdown of Value Revenues for Interconnect, Capacitor and Gates for the Years 2015, 2020 & 2027
Total Companies Profiled: 36

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